To recognize the important contributions of young scientists/engineers in reference to their contributions to fundamental research, integration, application, or education.
Award/Recognition Menu
$2,000 and a Plaque
Funded by the IEEE Ultrasonics, Ferroelectrics, and Frequency Control Society.
Award will be presented at International Symposium on the Applications of Ferroelectrics
Established in 2006
The award recipient will be chosen according to the following criteria: (i) contribution of the publication record (including patents) to the ferroelectrics community, (ii) impact of industrial research and development of ferroelectric applications, and (iii) educational contributions to the ferroelectrics community, and (iv) participation in UFFC-S activities. Votes will be solicited by the Ferroelectrics Committee by email balloting.
Must be an IEEE UFFC member upon conferring of the award, and must be 40 years or younger, at the time of nomination.
2025
For contributions to synthesis and electromechanical property understanding of ionic molecular and metal oxide ferroelectrics, and extensive collaboration with the international ferroelectric community.
2024
In recognition of his significant contribution to research and education in the field of ferroelectric materials based on hafnium oxide.
2023
For fundamental understanding of ferroelectric hafnia films and the development of related novel applications
For his exciting out-of-the-box work on ferroelectrics and new way exploration of old materials.
2022
For her outstanding contributions to our understanding of the links between the crystallography, structure and applicable properties of ferroelectric materials.
2021
For his outstanding contributions to the experimental physics of ferroelectric superlattices, negative capacitance in ferroelectrics and flexoelectricity.
2020
For his outstanding contributions to the fundamental understanding of relaxor ferroelectric - lead titanate single crystals and ceramics.
2019
For his pioneering work on emergent behavior in ferroic thin films.
2018
For his pioneering work on processing of chemically complex ferroelectric ceramics.
2017
For contributions to the understanding of mechanical, fracture and ferroelastic properties of ferroelectric ceramics.
2016
For significantly advancing the processing and integration science of thin film ferroelectrics for practical applications.
2015
For his oustanding contributions in developments of thin films and integration in micromechanical systems and devices.
2014
For his pioneering efforts in the development of nano-scale material concepts that have led to next generation ferroelectric thin film materials and devices.
For his outstanding contributions in experiments and theory of nanoscale electromechanical phenomena in ferroelectric thin films and interfaces.
2013
For her contributions in the field of piezoelectric films, as well as service to the IEEE UFFC society.
2012
For his contribution in development of lead-free piezoelectric ceramics, structural-property.
2011
For his outstanding contributions to the field of ferroelectrics using advanced in situ diffraction tools.
For his contributions to piezoelectric crystals, focusing on the relationship between structure, properties, and device performance.
2010
For the development of scanning probe techniques and seminal contributions in understanding and controlling polarization switching in ferroeletric materials by piezoresponse force microscopy/spectroscopy on the nm scale, and deciphering switching mechanisms on a single defect level.
2009
For his significant contributions to the growth, characterization, and defect engineering in lead-free ferroelectric/piezoelectric single crystals.
2008
For his contributions to the fundamental science that underpins the synthesis of ferroelectric thin films and for his research highlighting the relationship between processing, structure, and properties in thin film devices.
2007
For his significant contributions to the integration of ferroelectric materials with non-precious metals and his substantial efforts in support of technical society meetings.
2006
For his significant contributions to the understanding of the structure and physical properties of ferroelectric thin films at the nanoscale.