For his outstanding contributions to the experimental physics of ferroelectric superlattices, negative capacitance in ferroelectrics and flexoelectricity
For his outstanding contributions to the fundamental understanding of relaxor ferroelectric - lead titanate single crystals and ceramics
For his pioneering work on emergent behavior in ferroic thin films
For his pioneering work on processing of chemically complex ferroelectric ceramics
For contributions to the understanding of mechanical, fracture and ferroelastic properties of ferroelectric ceramics
For significantly advancing the processing and integration science of thin film ferroelectrics for practical applications
For his oustanding contributions in developments of thin films and integration in micromechanical systems and devices
For his outstanding contributions in experiments and theory of nanoscale electromechanical phenomena in ferroelectric thin films and interfaces.
For his pioneering efforts in the development of nano-scale material concepts that have led to next generation ferroelectric thin film materials and devices.
For her contributions in the field of piezoelectric films, as well as service to the IEEE UFFC society.
For his contribution in development of lead-free piezoelectric ceramics, structural-property.
For his contributions to piezoelectric crystals, focusing on the relationship between structure, properties, and device performance.
For his outstanding contributions to the field of ferroelectrics using advanced in situ diffraction tools.
For the development of scanning probe techniques and seminal contributions in understanding and controlling polarization switching in ferroeletric materials by piezoresponse force microscopy/spectroscopy on the nm scale, and deciphering switching mechanisms on a single defect level.
For his significant contributions to the growth, characterization, and defect engineering in lead-free ferroelectric/piezoelectric single crystals.
For his contributions to the fundamental science that underpins the synthesis of ferroelectric thin films and for his research highlighting the relationship between processing, structure, and properties in thin film devices.
For his significant contributions to the integration of ferroelectric materials with non-precious metals and his substantial efforts in support of technical society meetings.
For his significant contributions to the understanding of the structure and physical properties of ferroelectric thin films at the nanoscale.